| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_03d0f52bb4069f8a19d70dcfb697c67a |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-108
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L25-18 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08K5-0033 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03C1-76 |
| filingDate |
2005-09-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1826cb53e8e5226054260a30aabfebb1 |
| publicationDate |
2006-03-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2006068322-A1 |
| titleOfInvention |
Positive resist composition and pattern forming method using the same |
| abstract |
A positive resist composition satisfying high sensitivity, high resolution and good line edge roughness at the same time, and a pattern forming method using the composition, are provided, which is a positive resist composition comprising (A) a resin of which solubility in an alkali developer increases under the action of an acid, the resin containing a repeating unit having a specific styrene skeleton and a repeating unit having a specific ring structure, and (B) a compound of generating an acid upon irradiation with actinic rays or radiation; and a pattern forming method using the composition. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I490647-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9090722-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I720995-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2008305574-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2010015554-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2012006788-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8900789-B2 |
| priorityDate |
2004-09-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |