| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_03d0f52bb4069f8a19d70dcfb697c67a |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08K5-0033 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08K5-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate |
2003-10-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bcbffcb64a5670ed86f001e8cc9bc95e |
| publicationDate |
2004-05-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2004087694-A1 |
| titleOfInvention |
Positive type resist composition |
| abstract |
A positive type resist composition comprising: (A) a resin having a monocyclic or polycyclic alicyclic hydrocarbon structure, which increases the solubility in an alkali developing solution by the action of an acid; (B) a compound capable of generating an acid upon irradiation with an actinic ray or a radiation; and (C) an alkoxy alcohol as a solvent, wherein an alkoxy group and an alcoholic hydroxyl group are connected to each other via at least three carbons. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2006068322-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1640409-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2005130058-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7410747-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7189491-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2012322007-A1 |
| priorityDate |
2002-11-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |