| abstract |
A surface-textured polishing pad suitable for chemical-mechanical polishing comprises a porous polymeric foam having an average pore cell size in the range of about 60 μm or less. At least about 75% of the pores in the foam have a pore cell size within about 30 μm of the average pore cell size. The pad has at least one textured surface that includes divots having a depth in the range of about 25 μm to about 1150 μm, a width in the range of about 0.25 μm to about 380 μm, and a length-to-width aspect ratio of about 1 to about 1000. In addition, the at least one textured surface of the pad includes at least about 10 divots per square centimeter of surface area, and has an average surface roughness of at least about 5 μm. Preferably, at least one textured surface has at least one pattern of spaced, parallel grooves imprinted thereon. |