| Predicate |
Object |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-029
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-126
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-122
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-121
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-146
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-111
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-106
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-125 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-028
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-031
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0295 |
| classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F2-48
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-031
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-029 |
| filingDate |
2001-03-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c77315eed383b4db45154000be830a70
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0e8e1787e4ee02bfa53f6243ea2f04f9 |
| publicationDate |
2004-02-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2004038149-A1 |
| titleOfInvention |
Photosensitive resin composition, photosensitive element comprising the same, method for producing resist pattern, and method for producing printed wiring board |
| abstract |
The present invention provides a photosensitive resin composition for laser scanning exposure, which satisfies the following formula (1): n - 25 ≦ E 1 - E 0 E 0 × 100 ≦ 25 ( 1 ) n n wherein E 0 represents an exposure amount in mJ/cm 2 at which the photosensitive resin composition is cured at the 21st step of the density 1.00 of a 41-step step tablet having a density range from 0.00 to 2.00, a density step of 0.05, a tablet size of 20 mm×187 mm and a step size of 3 mm×12 mm, by irradiation with a full wavelength active light of a high pressure mercury lamp and E 1 represents an exposure amount in mJ/cm 2 at which the photosensitive resin composition after being left for 2 hours under 40 W non-ultraviolet white lamp is cured at the 21st step of the 41-step step tablet by irradiation with a full wavelength active light from a high pressure mercury lamp. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2007292804-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2007289874-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2007054220-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2006210923-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7662541-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7544461-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7655380-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8071402-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8062915-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8097479-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7067226-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2010196665-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2008118867-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7713768-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2010093950-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2004112859-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8003297-B2 |
| priorityDate |
2000-03-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |