| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_f09378c018e7719f171f7e91f2dd60fd |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B41C2210-22
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B41C2210-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B41C2210-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B41C2210-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-106
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-146 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B41C1-1008
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B41M5-368
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-06 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-00 |
| filingDate |
2005-07-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2009-06-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_80d18cfa942bc3fe58bb0da9653a3fe3
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ab0ca15420202c1de9a1bad3ce422c4f
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_55ff158c0d13a42c7b9e50f48d4d1a24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2e266f4cb3b8de826114f79c58113b74 |
| publicationDate |
2009-06-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-7544461-B2 |
| titleOfInvention |
Near infrared ray activation type positive resin composition |
| abstract |
A near infrared ray activation type positive resist composition comprisingn (A) a vinyl-based polymer having a monomer unit having an alkali-soluble group blocked by an ether having an alkenyl group next to an ether oxygen, (B) a photothermal converting substance generating heat by a light in the near infrared region, (C) a thermal acid generator generating an acid by heat, can provide a near infrared ray activation type positive resist composition which can be subjected to an exposure treatment in a complete bright room such as under a white light and the like, gives desired sensitivity and resolution, and of which baking treatment conditions can be relaxed or a baking treatment can be omitted, and a pattern formation method using the same. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2009045552-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9389186-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9212997-B2 |
| priorityDate |
2004-07-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |