| Predicate |
Object |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-027 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-028
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-09
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B32B27-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B32B27-06 |
| classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-027 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-028
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-09
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B32B27-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B32B27-06 |
| filingDate |
2001-09-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_182c46e72b644cdfb193e0792a53da36
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_804dd261d8c6dd91d521290c6868d9f2
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7244dc84026e932ee8e103d20446e4e5 |
| publicationDate |
2004-01-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2004018446-A1 |
| titleOfInvention |
Photosensitive element, method for forming resist pattern, and method for manufacturing printed wiring board |
| abstract |
A photosensitive element comprising a support film and a photosensitive resin layer formed on the support film is provided, wherein the support film is a multilayer support film comprising at least three layers; and wherein the photosensitive resin layer comprises a photosensitive resin composition comprising (A) a binder polymer, (B) a photopolymerizable compound having at least one polymerizable ethylenically unsaturated group within a molecule, and (C) a photopolymerization initiator. Also provided are a method of forming a resist pattern comprising the steps of laminating such a photosensitive element onto a circuit-forming substrate such that the photosensitive resin layer comes into close contact therewith; forming an exposure part by irradiating a predetermined part of the photosensitive resin layer with an active light beam; and then eliminating a part other than the exposure part; and a method of making a printed circuit board comprising the step of etching or plating the circuit-forming substrate formed with a resist pattern by this method of forming a resist pattern. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7950837-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9161442-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7232247-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2009185059-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2008063955-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11343918-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7059755-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2007263403-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2007263404-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7753573-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8674233-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2005088853-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2005041434-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8026045-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2010266258-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1894972-A3
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1894972-A2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7105265-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7484872-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7645062-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2004112859-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7067226-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7751678-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2009231875-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2005130055-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8326110-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2008241759-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2017005946-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2010315828-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2008260341-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8506147-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2006120081-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100994311-B1 |
| priorityDate |
2000-09-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |