http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2005130055-A1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-42 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03C5-16 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-42 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-40 |
| filingDate | 2004-12-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_68095c7c31b8267754a368d8ff73c802 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5dd308a238b831ad1eefbd94875bbd61 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f3f40fb4bf40f48e0725ca420a0b6106 |
| publicationDate | 2005-06-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | US-2005130055-A1 |
| titleOfInvention | Method and removing resist pattern |
| abstract | A method for removing a resist pattern having a resist pattern forming step of forming a resist pattern on a substrate using a chemically amplified positive resist composition and a removing step of removing the resist pattern from the substrate using a solvent, a composition prepared by dissolving (A) an alkali soluble resin having a hydroxyl group in the side chain, (B) a photo acid generator and (C) a compound represented by the following general formula (I): n nH 2 C═CH—O—R 1 O—CH═CH 2 (I) n nwherein R 1 represents an alkylene group having 1 to 10 carbon atoms or the like, in an organic solvent being used as the chemically amplified positive resist composition, the method further having a heat treatment step of heat-treating the substrate on which the resist pattern is formed at a temperature of 150 to 400° C. between the resist pattern forming step and the removing step. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10222697-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2012107563-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2016266492-A1 |
| priorityDate | 2003-12-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 256.