patent/US-2003124818-A1

http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2003124818-A1

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Predicate	Object
assignee	http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_bce787970b69aeb08d159e7c101c9ed7
classificationCPCInventive	http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-24 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-308 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-402 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-345
classificationIPCInventive	http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-24 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-34 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-30 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-40
filingDate	2001-12-28-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor	http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8b5c833619350141a81983f76d740dd2 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e81986ba39cecc6a3325e41dfe2c235b http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b699a221203b550d1c2982628f4a0fd4 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1add66d1c5f2724155b77379e53e0f91 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b06f1606db14358bb3eb4aa46db84b5d
publicationDate	2003-07-03-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber	US-2003124818-A1
titleOfInvention	Method and apparatus for forming silicon containing films
abstract	The present invention describes a method and apparatus for forming a uniform silicon containing film in a single wafer reactor. According to the present invention, a silicon containing film is deposited in a resistively heated single wafer chamber utilizing a process gas having a silicon source gas and which provides an activation energy less than 0.5 eV at a temperature between 750° C.-550° C.
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