| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_b94baf1aad802afc19b0e63b4499b04d |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-106
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D495-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C69-753
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G61-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D401-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D413-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D471-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0382
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 |
| classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F4-80
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L65-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F32-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F32-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L45-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G61-08 |
| filingDate |
2002-02-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7ff101a31073291221f7a60065317b49
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_66a73adeb56bb2293746e9f4f4d39cf3
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_62f43212b2edde752796d53cdbfa4b61
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ff20d92cc969c6f34139386013aee406 |
| publicationDate |
2002-09-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2002136982-A1 |
| titleOfInvention |
Photoresist compositions comprising polycyclic polymers with acid labile pendant groups |
| abstract |
The present invention relates to a radiation sensitive photoresist composition comprising a photoacid initiator and a polycyclic polymer comprising repeating units that contain pendant acid labile groups. Upon exposure to an imaging radiation source the photoacid initiator generates an acid which cleaves the pendant acid labile groups effecting a polarity change in the polymer. The polymer is rendered soluble in an aqueous base in the areas exposed to the imaging source. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2010120937-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2008124651-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7300739-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2007026339-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10131843-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9057951-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7608382-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7808083-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2004166436-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7341816-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2008277805-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2010266958-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2006008734-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7524594-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7563558-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2008233517-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7393624-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2011053083-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2007259274-A1 |
| priorityDate |
1996-03-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |