Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_dfcdab27b778da1d6b6420d581d0c2fe |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-24355 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-327 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0047 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0042 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0043 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0002 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-00 |
filingDate |
2017-10-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate |
2020-09-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c1f4c4c394dcd7d274421b3a14b48820 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3e8d682a8b9f843d49dbe4b4a03f2490 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2f4ef09992cf34c3fd03e6e6e113d65e http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_96bb75b1446dc2293d0992883fafb548 |
publicationDate |
2020-09-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
US-10782610-B2 |
titleOfInvention |
Radiation based patterning methods |
abstract |
Stabilized precursor solutions can be used to form radiation inorganic coating materials. The precursor solutions generally comprise metal suboxide cations, peroxide-based ligands and polyatomic anions. Design of the precursor solutions can be performed to achieve a high level of stability of the precursor solutions. The resulting coating materials can be designed for patterning with a selected radiation, such as ultraviolet light, x-ray radiation or electron beam radiation. The radiation patterned coating material can have a high contrast with respect to material properties, such that development of a latent image can be successful to form lines with very low line-width roughness and adjacent structures with a very small pitch. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11314168-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11209729-B2 |
priorityDate |
2010-06-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |