| abstract |
In one embodiment, the present invention provides a method of transferring a pattern formed by a vertical spacer having spacers disposed on a template to the template, comprising: enhancing the cyclic deposition by a plasma to form a layer of the umbrella layer as a spacer Deposited only on the top surface of each of the vertical spacers made of tantalum or metal oxide, wherein substantially no layer is deposited on the sidewalls of the vertical spacer and the exposed surface of the template, followed by the use of a spacer layer The vertical spacer transfers the pattern formed by the vertical spacers to the template by anisotropic etching. |