| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_6f932d94618d9b875e401457b33e9761 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-168
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-075 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-31
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-075
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 |
| filingDate |
2019-02-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_955d038553434dd7285716fd6538e556
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_acf6a178eb0fefd5d4db1071e0f3db00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_15b48317f3d8bc31d43930453e474b48
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_dfe9a7efc8ff1fb517c6c0fc8bf7fafb |
| publicationDate |
2020-08-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20200099864-A |
| titleOfInvention |
Positive-type photosensitive resin composition and insulation layer formed from the same |
| abstract |
The present invention is a binder resin; Photoacid generator; And a solvent; wherein the binder resin is characterized by containing a first resin containing a structural unit represented by the following formula (1), and thus has excellent adhesion to the substrate without including a separate silane coupling agent. In addition, it relates to a positive photosensitive resin composition having excellent sensitivity and improved productivity, and an insulating film formed therefrom. [Formula 1] (In Formula 1, R 1 is a hydrogen atom or a methyl group, R 2 is a C4 to C10 alkylene group). |
| priorityDate |
2019-02-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |