| abstract |
And provides a technique for forming a film in which the formation of a three-dimensional pattern is satisfactorily performed. In one embodiment, a film forming method for an object to be processed is provided. Wherein the object to be processed has a supporting base and a layer to be processed, the layer to be treated is provided on a main surface of the supporting base and has a plurality of convex regions, each of the plurality of convex regions extends upwardly from the main surface, Each cross section is exposed when viewed on the main surface. The method includes a first step of forming a film on each end surface of a plurality of convex regions, and a second step of anisotropically etching the film formed by the first step to selectively expose one or a plurality of end faces. |