Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_268be9afa00cf55b5aa72b1612151ecb |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-303 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-302 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-301 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-382 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-281 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-282 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-42 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D125-18 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D125-16 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F112-24 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0758 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0382 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-30 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-16 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F20-30 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F212-24 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F212-32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F212-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F12-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F12-24 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F12-30 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-22 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-50 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-283 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F12-20 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-50 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F20-30 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F12-24 |
filingDate |
2016-02-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_075a3a80b789dfad4c9a83d380354072 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0d15348ba694d559b9898c7d0043b3f6 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1fc873c420032407403583685751ea8e http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1037a749a7d25144305b690cd1dbda52 |
publicationDate |
2017-09-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
KR-20170108092-A |
titleOfInvention |
A mask blank having an actinic radiation-sensitive or radiation-sensitive resin composition, an actinic radiation or radiation-sensitive film, a light-actinic radiation-sensitive or radiation-sensitive film, a pattern forming method, and a manufacturing method of an electronic device |
abstract |
(A) in which the dissolution rate with respect to an alkali developing solution is lowered by the action of an acid, a compound having a group which is decomposed by the action of an alkali developing solution to increase the solubility in an alkali developing solution and has at least one of a fluorine atom and a silicon atom Sensitive active or radiation-sensitive resin composition containing a resin (B) and a resin (C) having a phenolic hydroxyl group different from the resin (B) An actinic ray-sensitive or radiation-sensitive film, and a mask blank, a method of forming a pattern using the actinic ray-sensitive or radiation-sensitive resin composition, and a method of manufacturing an electronic device. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20160120232-A |
priorityDate |
2015-02-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |