http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2008162101-A

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assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_268be9afa00cf55b5aa72b1612151ecb
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B82B3-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B29C59-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G11B5-84
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B29C33-38
filingDate 2006-12-27-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c9a2a5989d8c76cd8aafc874bcebcd92
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8c04ea99ee66927c64a032927fe36ef7
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_98f73e54545ff2527d41217bc4685884
publicationDate 2008-07-17-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2008162101-A
titleOfInvention Method for manufacturing mold structure
abstract The present invention provides a mold structure manufacturing method for efficiently producing a mold structure for transferring and forming a high-quality pattern on a discrete track medium or a patterned medium. The uneven portion is pressed by pressing the uneven portion side against an imprint resist applied on one surface of a light-transmitting substrate with a master having an uneven portion formed on the surface. A transfer step of transferring the shape of the image onto the imprint resist; A curing step of curing the imprint resist; A pattern forming step of etching one surface of the substrate to be processed by using the imprint resist cured in the curing step as a mask to form a concavo-convex pattern on the one surface of the substrate to be processed. This is a method for manufacturing a mold structure. [Selection] Figure 2B
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priorityDate 2006-12-27-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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Total number of triples: 51.