http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20170103670-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fcc0b66123940d1b32783569ebfa2d45 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 |
| filingDate | 2017-03-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fa485c7f56d146cd9f855a87b1388ab7 |
| publicationDate | 2017-09-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-20170103670-A |
| titleOfInvention | Radiation-sensitive resin composition, process for forming resist pattern, radiation-sensitive acid generator, and compound |
| abstract | [PROBLEMS] To provide a radiation-sensitive resin composition excellent in LWR performance and the like. [Solution] The present invention relates to a radiation-sensitive resin composition containing a polymer having a first structural unit containing an acid-dissociable group, a compound represented by the formula (1), and a solvent. In the formula (1), R 1 and R 2 are monovalent organic groups which do not contain a hydrogen atom or a fluorine atom having 1 to 20 carbon atoms. R 3 , R 4 , R 5 , R 6 and R 7 are each a hydrogen atom, a fluorine atom or a monovalent organic group having 1 to 20 carbon atoms. Provided that at least one of R 1 , R 2 , R 3 and R 4 represents a group represented by OR Q. R Q is a hydrogen atom or a monovalent organic group having 1 to 20 carbon atoms. R 1 and R 2 , R 1 and R 3 , R 1 and R 5 , R 3 and R 4 , R 3 and R 5 , or R 5 and R 6 combine with each other to form, together with the carbon atom to which they are bonded, 20 ring structure. Y - is SO 3 - or COO - . X < + & gt ; is a monovalent, radiosensitive onium cation. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20210027087-A |
| priorityDate | 2016-03-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 129.