Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_ed62b7551998e54b35784cdbbb2778d5 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02337 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-52 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02126 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-56 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3086 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3081 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02247 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-30604 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02211 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0217 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0254 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-4554 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45544 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45542 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45527 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-34 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-205 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02312 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02318 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02304 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02315 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0228 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02274 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0234 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-31 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-205 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-34 |
filingDate |
2015-06-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_50a8f58ed3604d6878d41dd7e56e6289 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_73318a510569d301679166a828cb6450 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_474c932f8beca75a8562f0bb1ff6ab4f http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8c180d0d987b9b534deadb7b0cb9cc28 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3cd060bc4a3d9ce9aba67e94c46a132b |
publicationDate |
2017-02-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
KR-20170018343-A |
titleOfInvention |
Substrate-processing device, program, and method for manufacturing semiconductor device |
abstract |
A method of manufacturing a semiconductor device, comprising: preparing a substrate having an oxide film formed on its surface; pretreating the surface of the oxide film; supplying a source gas to the substrate; supplying a carbon- Is performed a predetermined number of times or a cycle of supplying a raw material gas to a substrate and a process of supplying a gas containing carbon and nitrogen to the substrate are performed a predetermined number of times A step of supplying a source gas containing carbon to the substrate and a step of supplying a nitrogen-containing gas to the substrate are performed a predetermined number of times to perform a predetermined number of times to form carbon on the surface of the oxide film after the pretreatment To form a nitride film. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11450524-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20210006499-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20200077500-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20200033743-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11348794-B2 |
priorityDate |
2014-06-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |