http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20160141569-A

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http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-40
filingDate 2015-06-01-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6394cc0a2cda2bf504ce1215bd368271
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_54cc11e35583738e77548d6784e3d58b
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publicationDate 2016-12-09-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-20160141569-A
titleOfInvention Composition for photoresist fine pattern and method for preparing the composition and method for reducing pattern dimension in photoresist layer using the same
abstract The present invention is a technology related to a composition for forming photoresist micropatterns containing a water-soluble polymer composition, a preparation method of the same, and a method for forming photoresist micropatterns using the same, and more specifically, to a composition for photoresist micropatterns, to a preparation method of the same, and to a method for forming photoresist micropatterns using the same, which reduces the size of contact holes of photoresist pattern by coating the photoresist pattern with a composition for forming photoresist micropatterns containing a water-soluble polymer of chemical formula 1 and a solvent.
priorityDate 2015-06-01-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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