| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_2baf849d216e689ecc40ccc931a7a7bc |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-38
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D167-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2059
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D133-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D133-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D133-066
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3085
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3081
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3086
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3088
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0273
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0271 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D167-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-38
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-11 |
| filingDate |
2014-12-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fe60277c47087e372b44e2f1e215cb7a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2d338fa9da212910df6f0916095817b8
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_61420cdd2c01ba119556edc46011abef |
| publicationDate |
2016-08-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20160099554-A |
| titleOfInvention |
Composition for forming underlayer film for electronic wiring resist and containing lactone-structure-containing polymer |
| abstract |
[PROBLEMS] To provide a resist underlayer film for electron beam lithography that reduces adverse effects caused by a substrate or an electron beam to form a good resist pattern in a straight shape. [MEANS FOR SOLVING PROBLEMS] An electron beam resist underlayer film forming composition comprising a polymer comprising a unit structure having a lactone ring and a unit structure having a hydroxy group. Polymer is a polymer obtained by copolymerizing a monomer mixture comprising lactone (meth) acrylate, hydroxyalkyl (meth) acrylate, and phenyl (meth) acrylate or benzyl (meth) acrylate. An electron beam resist underlayer film forming composition is coated on a substrate and heated to form an electron beam resist underlayer film, an electron beam resist is coated on the film, the substrate coated with the electron beam resist underlayer film and the electron beam resist is irradiated with electron beams, And transferring an image onto the substrate by dry etching to form an integrated circuit element. |
| priorityDate |
2013-12-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |