http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2008076551-A
Outgoing Links
Predicate | Object |
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assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_2baf849d216e689ecc40ccc931a7a7bc |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-11 |
filingDate | 2006-09-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e30511d91c507ee032d8867ae76d180d http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1f0d7b774dce0fe1491977f4b9add11b |
publicationDate | 2008-04-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | JP-2008076551-A |
titleOfInvention | Electron beam curing resist underlayer film forming composition |
abstract | 【Task】 Provided is a resist underlayer film forming composition used in a lithography process for manufacturing a semiconductor device. A composition for forming a resist underlayer film comprising a polymerizable substance, which is a composition for curing an underlayer film used for a lower layer of a photoresist by electron beam irradiation in a lithography process for manufacturing a semiconductor device. The polymerizable substance is a compound having at least one reactive group capable of being polymerized by electron beam irradiation. A reactive group capable of being polymerized by electron beam irradiation is a reactive group having an unsaturated multiple bond of carbon and carbon. The reactive group having a carbon-to-carbon unsaturated multiple bond is an acrylate group, a methacrylate group, or a vinyl ether group. [Selection] Figure 1 |
isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20160099554-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10289002-B2 |
priorityDate | 2006-09-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 154.