http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H1165125-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89afae566b725ae78e20cf972d9bcdc7 |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-151 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-091 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-09 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-11 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D5-00 |
| filingDate | 1997-08-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_11afba3cb21b2f665bb1b91dad62e33d http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7f08ea87295ed56b59dae70df070c234 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_24f8bf477f707b9caa33893f8233d149 |
| publicationDate | 1999-03-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-H1165125-A |
| titleOfInvention | Pattern formation method |
| abstract | (57) Abstract: The present invention provides a pattern forming method capable of forming a resist pattern excellent in dimensional accuracy and cross-sectional shape without generating an intermixing layer between a resist composition layer and an antireflection film. To provide. An actinic ray is applied to a coating film obtained by applying a composition solution for forming an antireflection film comprising (A) a compound which undergoes a crosslinking reaction upon irradiation with actinic rays and (B) a dye on a substrate. After forming an anti-reflection film by irradiating the entire surface with, a resist solution is applied on the anti-reflection film, dried to form a resist layer, and then subjected to lithography to form a resist pattern on the anti-reflection film. A pattern forming method characterized by the above-mentioned. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2008076551-A |
| priorityDate | 1997-08-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 262.