| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_2baf849d216e689ecc40ccc931a7a7bc |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-11 |
| filingDate |
2010-07-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0207ac1bc5b6dff996919c7180c91bf6
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e84a5fcf1cde2b8ef8270a3fb19c1e33
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2d338fa9da212910df6f0916095817b8
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9a3579c572b14e0aa2593bb7b9688e70 |
| publicationDate |
2012-05-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20120045028-A |
| titleOfInvention |
A resist underlayer film forming composition containing a polymer type photoacid generator and a method of forming a resist pattern using the same |
| abstract |
[PROBLEMS] To provide a resist underlayer film forming composition containing a polymer type photoacid generator and a method of forming a resist pattern using the same. [Resolution] The resist underlayer film forming composition containing the polymer which has a structural unit represented by a following formula (A-1) or a structural unit represented by a following formula (A-2). In formula (A-1) and formula (A-2), R < 1> , R < 2> , R < 3> , R < 4> , R < 5> and R < 6> represent an organic group.} |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20160026875-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20160099554-A |
| priorityDate |
2009-08-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |