http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20150107663-A

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filingDate 2015-03-12-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_357f162becdd0ca0ee9479a013207021
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8541687be6a795047f8d6cf8bc353916
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publicationDate 2015-09-23-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-20150107663-A
titleOfInvention Separation and regeneration apparatus and substrate processing apparatus
abstract The present invention aims at reliably removing liquid on a wafer (W), reducing the operation cost, and removing F ions. The separating and regenerating apparatus comprises a supercritical processing unit (3) for producing a mixed gas having a first fluorine-containing organic solvent having a first boiling point and a second fluorine-containing organic solvent having a second boiling point lower than the first boiling point, Hot water 34W having a temperature between the boiling point of the first boiling point and the boiling point of the second boiling point 34W is accommodated and the mixed gas is introduced into the hot water 34W to obtain the first fluorinated organic solvent of liquid form and the second fluorinated organic solvent of the gaseous form And a distillation tank 34 for separating. An introducing line 50 for introducing the mixed gas from the supercritical processing unit 3 to the distillation tank 34 is provided and the leading end 50a of the introducing line 50 is disposed in the hot water 34W.
priorityDate 2014-03-13-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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