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filingDate 2010-03-05-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ef84ee8e2122752f5964534cacd6d602
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publicationDate 2011-09-22-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2011187570-A
titleOfInvention Supercritical processing apparatus and supercritical processing method
abstract The present invention provides a supercritical processing apparatus and a supercritical processing method that suppress the occurrence of pattern collapse and the incorporation of a substance constituting a processing liquid into a substrate. A processing container contains a substrate to be processed with a supercritical fluid, and a liquid supply unit supplies a processing liquid containing a fluorine compound into the processing container. The fluid discharge unit discharges the supercritical fluid from the processing container, and the thermal decomposition component exclusion unit excludes a component that promotes thermal decomposition of the liquid from the processing container or the liquid supplied from the liquid supply unit. The heating unit heats the treatment liquid containing a fluorine compound that is hydrofluoroether or hydrofluorocarbon. [Selection] Figure 2
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