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filingDate 2013-07-10-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2015-04-06-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-20150035593-A
titleOfInvention Pattern forming method and substrate processing system
abstract An etching step of etching a silicon-containing film on a substrate via a mask by a plasma generated from an etching gas containing a fluorocarbon (CF) gas and forming a predetermined pattern on the silicon-containing film; And a film forming step of forming a silicon oxide film or a silicon nitride film on the surface of the predetermined pattern by oxidizing or nitriding the layer adsorbed on the surface of the predetermined pattern by a plasma generated from an oxidizing gas or a nitriding gas Is provided.
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