abstract |
The present invention relates to a photoresist composition containing a polymer having a structural unit (I) containing an acid-dissociable group and a compound (I) represented by the following formula (1). In the formula (1), R 1 , R 2 , R 3 and R are each a hydrogen atom or a monovalent organic group having 1 to 20 carbon atoms. X is a single bond, an oxygen atom or -NR a -. This R a is a hydrogen atom, a hydroxyl group or a monovalent organic group having 1 to 20 carbon atoms, and may be bonded to each other to form a ring structure. A - is -SO 3 - or -CO 2 - . M + is a monovalent onium cation. |