| abstract |
A resist composition which generates an acid upon exposure to light and changes its solubility in a developing solution by the action of an acid, comprising a base component (A) in which the solubility in a developer is changed by the action of an acid and a base component light degradable made of a compound that? destination resist composition comprising the (D0). [wherein, R 1 is a hydrocarbon group of 4 to 20 carbon atoms which may have a substituent, Y 1 is a single bond or a And R 2 and R 3 independently represent a substituent having 0 to 20 carbon atoms which is not a fluorine atom, and any one of R 2 and R 3 may form a ring with Y 1, and M m + It is a cation. m is an integer of 1 or more.] |