| abstract |
The electrostatic chuck 1A includes a susceptor 11A having an adsorption surface 11a for adsorbing a semiconductor, and an electrostatic chuck electrode 4 embedded in the susceptor. The susceptor 11A is provided with a plate-shaped main body 3 and a surface corrosion resistant layer 2 facing the suction surface 11a. The surface corrosion resistant layer 2 consists of a ceramic material which has magnesium, aluminum, oxygen, and nitrogen as a main component, and this ceramic material has magnesium which the XRD peak at the time of using CuK (alpha) is at least 2 (theta) = 47 degrees-50 degrees. The aluminum oxynitride phase is taken as the main phase. |