Predicate |
Object |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-283 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F212-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-16 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-302 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-36 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-30 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F224-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F8-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F212-22 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-18 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F8-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F224-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F212-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-30 |
filingDate |
2017-10-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate |
2021-01-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationDate |
2021-01-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
KR-102208103-B1 |
titleOfInvention |
Method for producing resin, and method for producing actinic ray-sensitive or radiation-sensitive composition |
abstract |
A method for producing a resin capable of forming a resin capable of forming a resist film having excellent resolution and reducing scum when forming a pattern, and a method for producing an actinic ray-sensitive or radiation-sensitive composition to provide. The manufacturing method of the resin is to prepare a resin containing a repeating unit represented by the general formula (1) and a repeating unit containing a group that is decomposed by the action of an acid to generate a polar group, and the repeating unit represented by the general formula (2) And, a first step of obtaining a resin precursor containing a repeating unit containing a group that is decomposed by the action of an acid to generate a polar group, and a group represented by -OY in the repeating unit represented by the general formula (2) in the resin precursor. , A second step of obtaining a repeating unit represented by General Formula (1) by deprotection with an acid or a base. |
priorityDate |
2016-10-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |