| Predicate |
Object |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B65D47-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-322
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-327
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L23-485
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0273
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B65D83-00 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L23-485 |
| filingDate |
2018-01-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2020-03-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate |
2020-03-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-102089286-B1 |
| titleOfInvention |
Photoresist developer composition and manufacturing method of semiconductor package using the same |
| abstract |
The present disclosure relates to a photoresist developer composition comprising a quaternary alkyl ammonium compound and a corrosion inhibitor, wherein the corrosion inhibitor comprises a silane-based compound and an azole-based compound, and a semiconductor package manufacturing method using the same. |
| priorityDate |
2018-01-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |