Chemical amplification resist composition, resist film using the composition, resist-coated mask blanks, resist pattern forming method, photomask and polymer compound
The chemically amplified resist composition comprises (A) a polymer compound having a structure in which the hydrogen atom of the phenolic hydroxyl group is substituted with a group having a non-acid decomposable polycyclic alicyclic hydrocarbon structure; And (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation.