| abstract |
A positive resist composition having improved pattern profile shape, sensitivity, resolution, line edge roughness, and dissolution contrast, and a pattern forming method using the same. (A) A resin having a repeating unit having a specific group and a repeating unit having a specific group, which decomposes by the action of an acid and increases the solubility in an alkali developer, and (B) an actinic ray or A positive resist composition containing a compound that generates an acid upon irradiation with radiation, and a pattern forming method using the same. [Selection figure] None |