| abstract |
A positive resist composition that simultaneously satisfies high resolution, LWR, exposure margin, pattern shape, and standing wave reduction performance even when a highly reflective substrate is used as it is without using an antireflection film, and the same Providing a pattern formation method using A positive resist composition containing a resin having a structure represented by the following general formulas (D1) to (D3) or a compound having a structure represented by the formulas (D1) to (D3) , And a pattern forming method using the same. In the formula, each symbol represents a predetermined atom or group. [Selection figure] None |