http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101488243-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05H1-34 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32119 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32449 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-205 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32633 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32642 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-321 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05H1-34 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-205 |
| filingDate | 2013-10-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2015-01-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2015-01-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-101488243-B1 |
| titleOfInvention | Inductively-coupled plasma reactor for plasma uniformity and efficiency enhancement and method for manufacturing semiconductor substrate using the device |
| abstract | The present invention provides a kind of inductance coupling plasma. Wherein the ceiling contained in the airtight cell comprises at least an insulating material window made of an insulating material. A substrate support is installed below the insulating material window of the airtight cell. A radio frequency power supply is located above the insulating material window and the radiated radio frequency energy penetrates the insulation material window and into the airtight cell. A plurality of process gas injectors are uniformly distributed on the substrate support to supply process gas into the gas tight cell. An annular adjuster is positioned within the gas tight cell and above the substrate support and below the plurality of process gas injectors to guide the process gas. |
| priorityDate | 2012-11-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 26.