http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101389828-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-304 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3212 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09G1-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-1454 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09G1-06 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K3-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304 |
| filingDate | 2012-05-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2014-05-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2014-05-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-101389828-B1 |
| titleOfInvention | Abrasive additives and slurry compositions comprising them |
| abstract | The present invention relates to a polishing additive, a slurry composition comprising the same, and a polishing method using the slurry composition. When the polishing process is performed using the slurry composition of the present invention, the conductivity is improved to activate the ionization of the slurry composition, It is possible to improve the polishing rate of the center portion and increase the polishing selectivity of the oxide film to the nitride film while securing an excellent polishing rate by the action of the anionic polymer and the ammonium salt. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10428242-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10957557-B2 |
| priorityDate | 2012-05-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 119.