http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101285750-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-205 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32192 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-205 |
| filingDate | 2011-01-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2013-07-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2013-07-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-101285750-B1 |
| titleOfInvention | Plasma treatment method and plasma treatment apparatus |
| abstract | Provided is a plasma processing method capable of removing Ti-based deposits on the surface of a processing chamber of a plasma processing apparatus without generating foreign substances such as boron oxide. After product etching (process S1: processing of a sample containing Ti material), a carbon-based deposition discharge (step S2) for depositing a carbon-based film on the Ti reaction product deposited on the surface of the process chamber, and then carbon deposited on the surface of the process chamber. A plasma treatment method includes a chlorine-based discharge (step S3) for removing a system film and Ti. |
| priorityDate | 2010-10-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 27.