| Predicate |
Object |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-20221
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-20214 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3244
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0217
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45544
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0228
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32082
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-205
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-50
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-4584
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-4585
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45548
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45565
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-4412
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32761 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-205
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065 |
| filingDate |
2011-02-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2013-02-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate |
2013-02-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-101236108-B1 |
| titleOfInvention |
Substrate processing apparatus and method of manufacturing semiconductor device |
| abstract |
Provided are a substrate processing apparatus and a semiconductor device manufacturing method capable of improving throughput while performing a dense substrate processing. The substrate processing apparatus is provided in a processing chamber and includes a substrate supporting part for supporting a substrate, a substrate supporting part moving mechanism for moving the substrate supporting part, a gas supply part for supplying gas to the processing chamber, and an exhaust part for exhausting gas from the processing chamber. And a plasma generation unit provided to face the substrate support. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101590823-B1 |
| priorityDate |
2010-02-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |