http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101029089-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45565 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45572 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-455 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-511 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3244 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32449 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-511 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065 |
| filingDate | 2007-06-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2011-04-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2011-04-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-101029089-B1 |
| titleOfInvention | Shower plate, plasma processing apparatus, plasma processing method and manufacturing method of electronic device using same |
| abstract | The cover plate provides an unnecessary shower plate. In the shower plate 105, which is disposed in the processing chamber 102 of the plasma processing apparatus and discharges the plasma excitation gas to generate plasma in the processing chamber 102, the shower plate 105 is integrally formed. The horizontal hole 111 which introduces the gas for plasma excitation from the gas introduction port 110 of the plasma processing apparatus, and the vertical hole 112 which communicates with this horizontal hole 111 were provided in the plate 105. |
| priorityDate | 2006-06-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 22.