http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100695840-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-31663 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02126 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02282 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76801 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3205 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3122 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D183-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02216 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3205 |
| filingDate | 2005-11-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2007-03-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2007-03-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-100695840-B1 |
| titleOfInvention | Silica-based film forming material, silica-based film and its manufacturing method, multilayer wiring and its manufacturing method and semiconductor device and its manufacturing method |
| abstract | An object of the present invention is to provide a silica-based coating having excellent etching resistance, chemical resistance and moisture resistance, good adhesion and low dielectric constant, and a silica-based coating forming material suitable for forming the silica coating. The silica based film forming material of this invention contains the silicone polymer which has a part of Si-CHx-bond structure. x represents the integer of 0-2. The form etc. which the silicone polymer obtains by hydrolyzing-condensation polymerization reaction of the silicone compound represented by General formula (1)-3 and the silicone compound represented by General formula (4)-7 are preferable.n n n [Formula 1]n n n n n n n n [Formula 2]n n n n n n n n [Formula 3]n n n n n n n n [Formula 4]n n n n n n n n [Formula 5]n n n n n n n n [Formula 6]n n n n n n n n [Formula 7]n n n n n n n n N in the formula (1) to 7 represents 0 or 1. R 1 represents any one of chlorine, bromine, fluorine and hydrogen when n = 0, and any one of hydrocarbons, aromatic hydrocarbons, hydrogen and carboxyl groups having 1 to 4 carbon atoms when n = 1. R < 2> represents either C1-C4 hydrocarbon, aromatic hydrocarbon, and hydrogen. R < 3> represents either C1-C3 hydrocarbon and aromatic hydrocarbon.n n n n Silica-based coatings, semiconductor devices, multilayer wiring, hydrolysis, polycondensation |
| priorityDate | 2005-07-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 23.