http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100585067-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/A61M2205-18 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/A61M2205-33 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/A61M5-16831 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate | 1999-07-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2006-05-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2006-05-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-100585067-B1 |
| titleOfInvention | Photosensitive polymer having a cyclic structure of the backbone and photosensitive copolymer comprising the same |
| abstract | Disclosed are a photosensitive polymer having a backbone having an annular structure and containing an alicyclic compound, a photosensitive copolymer comprising the same, and a resist composition obtained therefrom. The photosensitive polymer which concerns on this invention has a following formula, and a weight average molecular weight is 3,000-100,000.n n n n n n n n Wherein R, R 1, R 2 are each ethyl or methoxy group hydrogen, methyl,, R 3 is a saturated aliphatic or alicyclic compound of a C 1 ~C 20. |
| priorityDate | 1999-07-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 67.