Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_526cb931f1382d6e016ee651d55e1365 |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S522-904 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-52 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F232-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F232-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F222-404 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-52 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F232-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F232-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F222-40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F222-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F2-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07D207-448 |
filingDate |
1998-08-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_cf90fc148d51b000194789d366cd969d |
publicationDate |
1999-06-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
JP-H11171935-A |
titleOfInvention |
Copolymer resin and method for producing the same, photoresist containing the copolymer resin, method for producing the same, and semiconductor element |
abstract |
(57) [Problem] To provide a photoresist having physical properties to withstand a TMAH developer. SOLUTION: This is a copolymer resin of the following general formula (I) obtained by copolymerizing an aliphatic cyclic olefin monomer and a maleimide monomer, and a photoresist containing the same. Embedded image In the above formula, R 1 is a primary, secondary or tertiary carbon atom having 1 to 10 carbon atoms. Represents a grade of aliphatic alcohol. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-106832125-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2015141528-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100682168-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7851575-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2008293036-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2007016163-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2011132542-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20010011771-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100546105-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2004264352-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7312292-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20020085041-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100682169-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100585067-B1 |
priorityDate |
1997-11-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |