| abstract |
The present invention relates to a copolymer represented by the following general formula (I) and a chemically amplified resist composition composed of the copolymer, an acid generator, and a solvent.n n n (I)n n n Wherein X is selected from those using monomers represented by the following general formulas (II), (III) and (IV),n n n n n n n n (II) (III) (IV)n n n R 1 is a straight or branched chain alkyl group having 1 to 10 carbon atoms, cyclic or multiple carbon atoms such as acetyl group, t-butyl oxycarbonyl group, cyclohexane carbonyl group, adamantane carbonyl group, bicyclo [2,2,1] heptane methyl carbonyl group Cyclic alkyl group, alkyl carbonyl group, branched alkyl carbonyl group, cyclic or polycyclic alkyl carbonyl group is shown. R 2 , R 3 and R 4 are straight or branched chains having 1 to 10 carbon atoms such as methyl group, ethyl group, t-butyl group, iso-furophyll group, adamantyl group, bicyclo [2,2,1] heptane methyl group It represents an alkyl group, a cyclic or polycyclic alkyl group, and is independent of each other. l + m + n + o is 1 and o has a value of 0.4-0.6. 1, m, and n are each 0.5 or less.n n n The chemically amplified resist using the polymer of the present invention has excellent substrate adhesion and dry etching resistance, and is excellent in high resolution, heat resistance, and the like, and excellent resist patterns can be obtained regardless of the type of substrate. |