| abstract |
A reaction tube that forms a processing chamber for processing a substrate, an electrode that is installed on the outer periphery of the reaction tube to form plasma in the processing chamber, an electrode fixing unit that fixes the electrode, and an outer periphery of the electrode fixing unit And a heating device for heating the inside of the reaction tube, wherein the electrode has a spacer for separating a certain distance from the surface of the electrode fixing unit. This makes it possible to provide a technique that enables uniform substrate processing. |