http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2017065207-A1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0325 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-30 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2041 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0382 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 |
| filingDate | 2016-10-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2018-08-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-WO2017065207-A1 |
| titleOfInvention | Resist composition and resist pattern forming method |
| abstract | A resist composition containing a base material component (A) whose solubility in a developing solution is changed by the action of an acid, and an acid generator component (B) that generates an acid upon exposure, wherein the acid generator component ( B) is an acid generator (B1) represented by the following general formula (b1), an acid generator (B2) represented by the following general formula (b2), and an acid represented by the following general formula (b3). Resist composition characterized by containing one or more generators (B3) (wherein R 1 to R 3 are each independently a cyclic group which may have a substituent, a chain form) Y 1 is a single bond or a divalent linking group containing an oxygen atom, M 1 + to M 3 + are monovalent organic cations, n is an integer from 1 to 4, m is an integer of 0 to 4, provided that when m is 0, R In, the carbon atom adjacent to the S atom is not bonded fluorine atoms). [Chemical 1] |
| priorityDate | 2015-10-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 205.