| abstract |
(57) [Problem] To be developed with an alkaline aqueous solution, and have low dielectric properties that have been difficult to realize simultaneously with these properties, along with various properties such as flatness, heat resistance, chemical resistance, and transparency. To provide a radiation-sensitive resin composition capable of easily forming a patterned thin film excellent in the above. SOLUTION: (A), (a-1) hexafluoropropylene, (a-2) unsaturated carboxylic acid and / or unsaturated carboxylic anhydride and (a-3) the above (a-1) Component and a fluorine-containing copolymer of component (a-2) and an unsaturated compound copolymerizable with component (B), a 1,2-quinonediazide compound, (C), a crosslinkable compound containing at least one crosslinkable group Compound, and (D), component (A), (B) A radiation-sensitive resin composition comprising an organic solvent in which the component and the component (C) are dissolved. |