http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20030026666-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_cf213be03285a0b93967ae2fd2fd351a |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0233 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-033 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0395 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0226 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-022 |
| filingDate | 2001-09-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fc828bbf14f7956f4c4e23e4c94950af http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_61fcdf2222f9b5898e886bde1d6962da http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8502ae6b6a1fe006ea59d1aae8784c98 |
| publicationDate | 2003-04-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-20030026666-A |
| titleOfInvention | Photosensitive resin composition |
| abstract | The present invention relates to a positive photosensitive cured film resin composition, and more particularly, (A) i) unsaturated carboxylic acid, unsaturated carboxylic anhydride, or a mixture thereof; Ii) epoxy group-containing unsaturated compounds; And iii) an acrylic copolymer having an area of 5% or less of an unreacted monomer of a copolymer of an olefinically unsaturated compound and a polymerization initiator, and having a polystyrene reduced weight average molecular weight of 5000 to 20,000; (B) 1,2-quinonediazide compounds; And (C) relates to a photosensitive resin composition comprising a nitrogen-containing crosslinking agent containing an alkanol group.n n n The photosensitive resin composition according to the present invention is excellent in various performances such as developability, residual film ratio, chemical resistance, heat resistance, and the like. In particular, it is easy to form a pattern as an interlayer insulating film and has excellent transmittance even in a thick film, such as a liquid crystal display device and an integrated circuit device. It is suitable as a material for forming the interlayer insulating film. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20200037764-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2019197113-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2014119849-A1 |
| priorityDate | 2001-09-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 362.