| abstract |
[PROBLEMS] To provide a high radiation sensitivity, a development margin capable of forming a good pattern shape even after development processing exceeding the optimum development time in the development process, and excellent adhesion to a substrate. A radiation-sensitive resin composition capable of easily forming a patterned thin film. The radiation sensitive resin composition includes [A] (a1) a specific unsaturated compound having a carboxyl group, (a2) a specific unsaturated compound having an alicyclic epoxy skeleton, and (a3) the above ( It contains a copolymer of unsaturated compounds other than a1) and (a2) and [B] 1,2-quinonediazide compound. [Selection figure] None |