| abstract |
PROBLEM TO BE SOLVED: To provide a polishing composition capable of forming a polished surface having a high polishing rate and excellent uniformity. SOLUTION: (1) water, (2) abrasive, (3) nitric acid, nitrous acid, hydrochloric acid, perchloric acid, chloric acid, chlorous acid, hypochlorous acid, boric acid, perboric acid, sulfuric acid, At least one anion selected from the group consisting of sulfurous acid, persulfuric acid, phosphoric acid, phosphorous acid, hypophosphorous acid, silicic acid, organic acids, and ions of hydrogen acids thereof, or a mixture thereof; (4) At least one type of cation selected from the group consisting of ammonium ions, alkali metal ions, and alkaline earth metal ions. A polishing composition comprising: (4) wherein the total amount of cations in (4) is 0.001 to 0. A polishing composition characterized by being 15 mol / l. |