| abstract |
PROBLEM TO BE SOLVED: To provide a polysilane which has excellent storage stability, is soluble in an organic solvent, can be easily formed into a thin film by a coating method, and can provide a thin film having excellent mechanical strength and heat resistance. Along with this polysilane, shows an anti-reflection function at the time of exposure, the etching rate ratio to resist is large In addition, an etching mask having excellent dry etching resistance is provided. SOLUTION: A repeating unit represented by the general formula [LPS-I] (where A is a divalent organic group, R 1 is a hydrogen atom or a substituted or unsubstituted hydrocarbon group, and A polysilane having: Embedded image |