| abstract |
(57) [Problem] To provide a photosensitive resin composition which does not decrease in film after pattern formation and is not affected by the material of a base material. A photosensitive resin composition containing at least a polyimide resin soluble in an organic solvent, a photopolymerizable unsaturated compound, a photopolymerization initiator and an organic solvent, wherein the photopolymerizable unsaturated compound is epoxy acrylate or 1 The above problem is solved by a photosensitive resin composition characterized by being a (meth) acrylic acid compound having three or more (meth) acryloyl groups in a molecule. |